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Conference contributions
Effect of inductively coupled electro-magnetic field on bottom oxide etch in a high aspect ratio trench
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Effect of inductively coupled electro-magnetic field on bottom oxide etch in a high aspect ratio trench
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Date
2020
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Sardo, Stefano
;
Palombizio, Antonio
;
Redolfi, Augusto
;
Mannarino, Manuel
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1970
since deposited on 2021-10-29
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Acq. date: 2026-02-25
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Views
1970
since deposited on 2021-10-29
1
last month
Acq. date: 2026-02-25
Citations