Publication:

Understanding the factors affecting contact resistance in nanowire field effect transistors (NWFETs) to improve nanoscale contacts for future scaling

Date

2022
Journal article
https://doi.org/10.1063/5.0092535
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dc.contributor.authorRamesh, Siva
dc.contributor.authorIvanov, Tsvetan
dc.contributor.authorSibaja-Hernandez, Arturo
dc.contributor.authorAlian, AliReza
dc.contributor.authorCamerotto, Elisabeth
dc.contributor.authorMilenin, Alexey
dc.contributor.authorPinna, Nicolo
dc.contributor.authorEl Kazzi, S.
dc.contributor.authorLin, Dennis
dc.contributor.authorLagrain, Pieter
dc.contributor.authorFavia, Paola
dc.contributor.authorBender, Hugo
dc.contributor.authorCollaert, Nadine
dc.contributor.authorDe Meyer, K.
dc.contributor.imecauthorIvanov, Tsvetan
dc.contributor.imecauthorSibaja-Hernandez, Arturo
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorCamerotto, Elisabeth
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorPinna, Nicolo
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorLagrain, Pieter
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecRamesh, Siva::0000-0002-8473-7258
dc.contributor.orcidimecIvanov, Tsvetan::0000-0003-3407-2742
dc.contributor.orcidimecAlian, AliReza::0000-0003-3463-416X
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecPinna, Nicolo::0000-0003-3392-0324
dc.contributor.orcidimecLagrain, Pieter::0000-0003-3734-7203
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2022-11-17T15:53:41Z
dc.date.available2022-07-28T02:30:39Z
dc.date.available2022-11-17T15:45:31Z
dc.date.available2022-11-17T15:53:41Z
dc.date.embargo2023-07-14
dc.date.issued2022
dc.identifier.doi10.1063/5.0092535
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40177
dc.publisherAIP Publishing
dc.source.beginpage024302
dc.source.endpagena
dc.source.issue2
dc.source.journalJOURNAL OF APPLIED PHYSICS
dc.source.numberofpages14
dc.source.volume132
dc.subject.keywordsTRANSMISSION-LINE MODEL
dc.subject.keywordsOHMIC CONTACTS
dc.subject.keywordsINGAAS
dc.subject.keywordsSURFACE
dc.title

Understanding the factors affecting contact resistance in nanowire field effect transistors (NWFETs) to improve nanoscale contacts for future scaling

dc.typeJournal article
dspace.entity.typePublication
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