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A novel in-situ resistance measurement to extract IMC resistivity and kinetic parameter for CoSn 3D stacks

Date

2017
Proceedings Paper
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dc.contributor.authorHou, Lin
dc.contributor.authorDerakhshandeh, Jaber
dc.contributor.authorDe Coster, Jeroen
dc.contributor.authorWang, Teng
dc.contributor.authorCherman, Vladimir
dc.contributor.authorBex, Pieter
dc.contributor.authorVan De Plas, Geert
dc.contributor.authorBeyer, Gerald
dc.contributor.authorBeyne, Eric
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.imecauthorHou, Lin
dc.contributor.imecauthorDerakhshandeh, Jaber
dc.contributor.imecauthorDe Coster, Jeroen
dc.contributor.imecauthorCherman, Vladimir
dc.contributor.imecauthorBex, Pieter
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorBeyne, Eric
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.orcidimecDerakhshandeh, Jaber::0000-0003-2448-9165
dc.contributor.orcidimecBex, Pieter::0000-0003-0896-2514
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.date.accessioned2021-10-24T05:52:56Z
dc.date.available2021-10-24T05:52:56Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28529
dc.identifier.urlhttp://ieeexplore.ieee.org/document/8309244/
dc.source.beginpage7.4
dc.source.conferenceIEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference - IEEE S3S
dc.source.conferencedate16/10/2017
dc.source.conferencelocationSan Francisco, CA USA
dc.title

A novel in-situ resistance measurement to extract IMC resistivity and kinetic parameter for CoSn 3D stacks

dc.typeProceedings paper
dspace.entity.typePublication
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