Publication:
Rapid recovery process of plasma damaged porous low-k dielectrics by wet surface modifying treatment
Date
| dc.contributor.author | Iwasaki, A, | |
| dc.contributor.author | Higuchi, A. | |
| dc.contributor.author | Komori, K. | |
| dc.contributor.author | Sato, M. | |
| dc.contributor.author | Kesters, Els | |
| dc.contributor.author | Le, Quoc Toan | |
| dc.contributor.author | Holsteyns, Frank | |
| dc.contributor.imecauthor | Kesters, Els | |
| dc.contributor.imecauthor | Le, Quoc Toan | |
| dc.contributor.imecauthor | Holsteyns, Frank | |
| dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
| dc.date.accessioned | 2021-10-23T11:29:33Z | |
| dc.date.available | 2021-10-23T11:29:33Z | |
| dc.date.issued | 2016 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26771 | |
| dc.identifier.url | http://www.scientific.net/SSP.255.223 | |
| dc.source.beginpage | 223 | |
| dc.source.conference | Ultra Clean Processing of Semiconductor Surfaces XIII - UCPSS | |
| dc.source.conferencedate | 11/09/2016 | |
| dc.source.conferencelocation | Knokke Belgium | |
| dc.source.endpage | 226 | |
| dc.title | Rapid recovery process of plasma damaged porous low-k dielectrics by wet surface modifying treatment | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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