Publication:
Reliability Investigations of Advanced Photosensitive Polymer based RDL Processes Protected by Inorganic Capping Layers
| dc.contributor.author | Chery, Emmanuel | |
| dc.contributor.author | Bhatia, Ritwik | |
| dc.contributor.author | Sundaram, Ganesh | |
| dc.contributor.author | Pinho, Nelson | |
| dc.contributor.author | Beyne, Eric | |
| dc.contributor.imecauthor | Chery, Emmanuel | |
| dc.contributor.imecauthor | Pinho, Nelson | |
| dc.contributor.imecauthor | Beyne, Eric | |
| dc.contributor.orcidimec | Chery, Emmanuel::0000-0002-2526-3873 | |
| dc.contributor.orcidimec | Pinho, Nelson::0000-0002-0701-5921 | |
| dc.contributor.orcidimec | Beyne, Eric::0000-0002-3096-050X | |
| dc.date.accessioned | 2025-04-10T15:07:30Z | |
| dc.date.available | 2024-12-07T16:57:01Z | |
| dc.date.available | 2025-04-10T15:07:30Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1109/ECTC51529.2024.00109 | |
| dc.identifier.eisbn | 979-8-3503-7598-5 | |
| dc.identifier.isbn | 979-8-3503-7599-2 | |
| dc.identifier.issn | 0569-5503 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/44932 | |
| dc.publisher | IEEE COMPUTER SOC | |
| dc.source.beginpage | 647 | |
| dc.source.conference | IEEE 74th Electronic Components and Technology Conference (ECTC) | |
| dc.source.conferencedate | MAY 28-31, 2024 | |
| dc.source.conferencelocation | Denver | |
| dc.source.endpage | 653 | |
| dc.source.journal | N/A | |
| dc.source.numberofpages | 7 | |
| dc.subject.keywords | COPPER | |
| dc.subject.keywords | AL2O3 | |
| dc.subject.keywords | DEPOSITION | |
| dc.subject.keywords | BARRIER | |
| dc.subject.keywords | METAL | |
| dc.title | Reliability Investigations of Advanced Photosensitive Polymer based RDL Processes Protected by Inorganic Capping Layers | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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