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Study of the interplay between dry etch and wet clean in patterning La2O3/HfO2 containing high-k/metal gate stacks
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Acq. date: 2026-02-24
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1 since deposited on 2021-10-18
Acq. date: 2026-02-24
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1900 since deposited on 2021-10-18
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Acq. date: 2026-02-24
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