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Study of the interplay between dry etch and wet clean in patterning La2O3/HfO2 containing high-k/metal gate stacks
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Study of the interplay between dry etch and wet clean in patterning La2O3/HfO2 containing high-k/metal gate stacks
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Date
2009
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19283.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vos, Ingrid
;
Hellin, David
;
Vrancken, Christa
;
Vecchio, Emma
;
Paraschiv, Vasile
;
Vertommen, Johan
;
Boullart, Werner
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since deposited on 2021-10-18
Acq. date: 2025-12-16
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1897
since deposited on 2021-10-18
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last month
Acq. date: 2025-12-16
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Downloads
1
since deposited on 2021-10-18
Acq. date: 2025-12-16
Views
1897
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-16
Citations