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Study of the interplay between dry etch and wet clean in patterning La2O3/HfO2 containing high-k/metal gate stacks

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Acq. date: 2026-03-17

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1 since deposited on 2021-10-18
Acq. date: 2026-03-17

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1902 since deposited on 2021-10-18
2last month
2last week
Acq. date: 2026-03-17

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