Publication:
Low temperature selective growth of epitaxial Si and Si1-xGex layers from SiH4 and GeH4 in an ultrahigh vacuum, very low pressure chemical vapour deposition reactor: kinetics and possibilities
Date
Loading...
Files
Journal
Abstract
Description
Metrics
Views
33296 since deposited on 2021-09-29
3last month
Acq. date: 2025-12-15
Citations
Metrics
Views
33296 since deposited on 2021-09-29
3last month
Acq. date: 2025-12-15
Citations