Mighty hight-t lithography for 65nm generation contacts

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Author(s)

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Montgomery, Patrick

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Maltabes, John G.

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Hughes, Gregory P,

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Mellenthin, David L.

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Socha, Robert J.

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Fanucchi, Eric L.

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Verhappen, Arjan

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Wampler, Kurt E.

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Schaefer, Erika

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Kuijten, Jan P.

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Pijnenburg, Wil

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Vandenberghe, Geert

Metrics

2054 since deposited on 2021-10-15

Acq. date: 2025-10-23