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Mighty hight-t lithography for 65nm generation contacts
Publication:
Mighty hight-t lithography for 65nm generation contacts
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Date
2003
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Conley, Will
;
Montgomery, Patrick
;
Lucas, Kevin
;
Litt, Lloyd C.
;
Maltabes, John G.
;
Dieu, Laurent
;
Hughes, Gregory P,
;
Mellenthin, David L.
;
Socha, Robert J.
;
Fanucchi, Eric L.
;
Verhappen, Arjan
;
Wampler, Kurt E.
;
Yu, Linda
;
Schaefer, Erika
;
Cassel, Shawn
;
Kuijten, Jan P.
;
Pijnenburg, Wil
;
Wiaux, Vincent
;
Vandenberghe, Geert
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2059
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-10
Citations