Publication:
Mechanisms of particle removal during brush scrubber cleaning
Date
| dc.contributor.author | Xu, Kaidong | |
| dc.contributor.author | Vos, Rita | |
| dc.contributor.author | Vereecke, Guy | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.author | Vinckier, Chris | |
| dc.contributor.author | Fransaer, Jan | |
| dc.contributor.imecauthor | Vos, Rita | |
| dc.contributor.imecauthor | Vereecke, Guy | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
| dc.date.accessioned | 2021-10-15T18:04:35Z | |
| dc.date.available | 2021-10-15T18:04:35Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9946 | |
| dc.source.beginpage | 137 | |
| dc.source.conference | Cleaning Technology in Semiconductor Device Manufacturing VIII. Proceedings of the International Symposium | |
| dc.source.conferencedate | 12/10/2003 | |
| dc.source.conferencelocation | Orlando, FL USA | |
| dc.source.endpage | 144 | |
| dc.title | Mechanisms of particle removal during brush scrubber cleaning | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |