Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Scaling perspective and reliability of conductive filament formation in ultra-scaled HfO2 resistive random access memory
Publication:
Scaling perspective and reliability of conductive filament formation in ultra-scaled HfO2 resistive random access memory
Copy permalink
Date
2017
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
34987.pdf
950.81 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Puglisi, F.M.
;
Celano, Umberto
;
Padovani, A.
;
Vandervorst, Wilfried
;
Larcher, Luca
;
Pavan, P.
Journal
Abstract
Description
Metrics
Views
1915
since deposited on 2021-10-24
Acq. date: 2025-12-10
Citations
Metrics
Views
1915
since deposited on 2021-10-24
Acq. date: 2025-12-10
Citations