Publication:

Electrochemical deposition of sub-nanometer Ni films on TiN

Date

2014
Journal article
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dc.contributor.authorVanpaemel, Johannes
dc.contributor.authorSugiura, Masahito
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVereecken, Philippe
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.date.accessioned2021-10-22T07:37:28Z
dc.date.available2021-10-22T07:37:28Z
dc.date.issued2014
dc.identifier.issn0743-7463
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24744
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/la404852m
dc.source.beginpage2047
dc.source.endpage2053
dc.source.issue8
dc.source.journalLangmuir
dc.source.volume30
dc.title

Electrochemical deposition of sub-nanometer Ni films on TiN

dc.typeJournal article
dspace.entity.typePublication
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