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Patterning of 25nm contact holes at 90nm pitch: combination of line/space double exposure immersion lithography and plasma-assisted shrink technology
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1938 since deposited on 2021-10-19
Acq. date: 2025-10-23
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Views
1938 since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations