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Defect creation stimulated by thermally activated hole trapping as the driving force behind negative bias temperature instability in SiO2, SiON, and high-k gate stacks
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1950 since deposited on 2021-10-17
2last month
Acq. date: 2025-12-10
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Metrics
Views
1950 since deposited on 2021-10-17
2last month
Acq. date: 2025-12-10
Citations