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EUV Lithography in pre-production mode

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dc.contributor.authorHendrickx, Eric
dc.contributor.authorHermans, Jan
dc.contributor.authorLorusso, Gian
dc.contributor.authorFoubert, Philippe
dc.contributor.authorPollentier, Ivan
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-20T11:34:10Z
dc.date.available2021-10-20T11:34:10Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20801
dc.source.conference56th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication - EIPBN
dc.source.conferencedate29/05/2012
dc.source.conferencelocationWaikoloa, HI USA
dc.title

EUV Lithography in pre-production mode

dc.typeOral presentation
dspace.entity.typePublication
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