Publication:

Silicon tip formation by isotropic SF6/HBr based dry etching

Date

2009
Meeting abstract
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dc.contributor.authorKunnen, Eddy
dc.contributor.authorSeveri, Simone
dc.contributor.authorVerheyen, Peter
dc.contributor.authorDupont, Tania
dc.contributor.authorVan Hoof, Rita
dc.contributor.authorVleugels, Frank
dc.contributor.authorHeck, J.
dc.contributor.authorBelov, N.
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorBoullart, Werner
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorDupont, Tania
dc.contributor.imecauthorVan Hoof, Rita
dc.contributor.imecauthorVleugels, Frank
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-17T23:38:14Z
dc.date.available2021-10-17T23:38:14Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15632
dc.source.conference2nd International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate26/02/2009
dc.source.conferencelocationLeuven Belgium
dc.title

Silicon tip formation by isotropic SF6/HBr based dry etching

dc.typeMeeting abstract
dspace.entity.typePublication
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