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Integration challenges and options of replacement high-k/metal gate technology for (Sub-)22nm technology nodes
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Integration challenges and options of replacement high-k/metal gate technology for (Sub-)22nm technology nodes
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Date
2013
Proceedings Paper
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26617.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Veloso, Anabela
;
Ragnarsson, Lars-Ake
;
Schram, Tom
;
Chew, Soon Aik
;
Boccardi, Guillaume
;
Thean, Aaron
;
Horiguchi, Naoto
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Acq. date: 2025-12-16
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Views
1849
since deposited on 2021-10-21
2
last month
Acq. date: 2025-12-16
Citations