Publication:
SLM device for 193 nm lithographic applications
Date
| dc.contributor.author | Lauria, John | |
| dc.contributor.author | Albright, Ronald | |
| dc.contributor.author | Vladimirsky, Olga | |
| dc.contributor.author | Chen, Luoqi | |
| dc.contributor.author | Hoeks, Maarten | |
| dc.contributor.author | Vanneer, Roel | |
| dc.contributor.author | van Drieënhuizen, Bert | |
| dc.contributor.author | Haspeslagh, Luc | |
| dc.contributor.author | Witvrouw, Ann | |
| dc.contributor.author | Schlatmann, Bart | |
| dc.contributor.imecauthor | Haspeslagh, Luc | |
| dc.date.accessioned | 2021-10-17T08:10:18Z | |
| dc.date.available | 2021-10-17T08:10:18Z | |
| dc.date.issued | 2008 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13989 | |
| dc.source.conference | MNE | |
| dc.source.conferencedate | 15/09/2008 | |
| dc.source.conferencelocation | Athens Greece | |
| dc.title | SLM device for 193 nm lithographic applications | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |