Publication:

Characterization and implementation of thermal ALD Al2O3 as surface passivation for industrial Si solar cells

Date

2009
Proceedings Paper
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dc.contributor.authorVermang, Bart
dc.contributor.authorLoozen, Xavier
dc.contributor.authorAllebe, Christophe
dc.contributor.authorJohn, Joachim
dc.contributor.authorVan Kerschaver, Emmanuel
dc.contributor.authorPoortmans, Jef
dc.contributor.authorMertens, Robert
dc.contributor.imecauthorVermang, Bart
dc.contributor.imecauthorJohn, Joachim
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecVermang, Bart::0000-0003-2669-2087
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-18T04:51:48Z
dc.date.available2021-10-18T04:51:48Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16485
dc.source.beginpage1051
dc.source.conference24th European Photovoltaic Solar Energy Conference and Exhibition - EPVSEC
dc.source.conferencedate21/09/2009
dc.source.conferencelocationHamburg Germany
dc.source.endpage1054
dc.title

Characterization and implementation of thermal ALD Al2O3 as surface passivation for industrial Si solar cells

dc.typeProceedings paper
dspace.entity.typePublication
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