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TVS measurements of metal ions in low-k dielectrics: effect of H2O uptake

Date

2008
Proceedings Paper
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dc.contributor.authorCiofi, Ivan
dc.contributor.authorTokei, Zsolt
dc.contributor.authorMangraviti, Giovanni
dc.contributor.authorBeyer, Gerald
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorMangraviti, Giovanni
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecMangraviti, Giovanni::0000-0001-5134-7205
dc.date.accessioned2021-10-17T06:32:56Z
dc.date.available2021-10-17T06:32:56Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13527
dc.source.beginpageN05.08
dc.source.conferenceMaterials and Processes for Advanced Interconnects for Microelectronics
dc.source.conferencedate24/03/2008
dc.source.conferencelocationSan Francisco, CA USA
dc.title

TVS measurements of metal ions in low-k dielectrics: effect of H2O uptake

dc.typeProceedings paper
dspace.entity.typePublication
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