Publication:

Probabilistic process window: a new approach to focus-exposure analysis

Date

2023

Journal article

https://doi.org/10.1117/1.JMM.22.2.021007

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Author(s)

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Yannuzzi, Jonathan

;

;

;

De Simone, Danilo

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Weldeslassie, Ataklti

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Vandenbroeck, Nadia

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Foubert, Philippe

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Beral, Christophe

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Charley, Anne-Laure

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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855 since deposited on 2024-01-09

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Acq. date: 2026-02-24