Publication:

Probabilistic process window: a new approach to focus-exposure analysis

Date

2023
Journal article
https://doi.org/10.1117/1.JMM.22.2.021007
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Author(s)

Mack, Chris A.
;
Yannuzzi, Jonathan
;
Lorusso, Gian  
;
Zidan, Mohamed  
;
De Simone, Danilo  
;
Weldeslassie, Ataklti  
;
Vandenbroeck, Nadia  
;
Foubert, Philippe  
;
Beral, Christophe  
;
Charley, Anne-Laure  

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

Abstract

Description

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851 since deposited on 2024-01-09
Acq. date: 2025-10-28

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851 since deposited on 2024-01-09
Acq. date: 2025-10-28

Citations