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Ion beam synthesis of buried CoxNi1-xSi2 layers in silicon

Date

1994
Proceedings Paper
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dc.contributor.authorWu, Ming Fang
dc.contributor.authorDe Wachter, Jo
dc.contributor.authorVan Bavel, Mieke
dc.contributor.authorPattyn, H.
dc.contributor.authorLangouche, G.
dc.contributor.authorVanhellemont, Jan
dc.contributor.authorBender, Hugo
dc.contributor.authorTemst, K.
dc.contributor.authorBruynseraede, Y.
dc.contributor.imecauthorVan Bavel, Mieke
dc.contributor.imecauthorBender, Hugo
dc.date.accessioned2021-09-29T12:53:50Z
dc.date.available2021-09-29T12:53:50Z
dc.date.embargo9999-12-31
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/468
dc.source.beginpage159
dc.source.conferenceSilicides, Germanides, and their Interfaces
dc.source.conferencedate29/11/1993
dc.source.conferencelocationBoston, MA USA
dc.source.endpage164
dc.title

Ion beam synthesis of buried CoxNi1-xSi2 layers in silicon

dc.typeProceedings paper
dspace.entity.typePublication
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