Publication:
Proximity effects correction for advanced optical lithography processes
Date
| dc.contributor.author | Tritchkov, Alexander | |
| dc.contributor.author | Finders, Jo | |
| dc.contributor.author | Randall, John | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | Van den hove, Luc | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.imecauthor | Van den hove, Luc | |
| dc.date.accessioned | 2021-10-01T09:07:32Z | |
| dc.date.available | 2021-10-01T09:07:32Z | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3002 | |
| dc.source.beginpage | 3585 | |
| dc.source.endpage | 3593 | |
| dc.source.issue | 6A | |
| dc.source.journal | Japanese Journal of Applied Physics. Part 1: Regular Papers | |
| dc.source.volume | 37 | |
| dc.title | Proximity effects correction for advanced optical lithography processes | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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