Publication:

Towards the understanding of resistive contrast imaging in in situ dielectric breakdown studies using a nanoprober setup

Date

2010
Proceedings Paper
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dc.contributor.authorLambrinou, Konstantza
dc.contributor.authorHantschel, Thomas
dc.contributor.authorArstila, Kai
dc.contributor.authorKleindiek, Stephan
dc.contributor.authorRummel, Andreas
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCroes, Kristof
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorCzarnecki, Piotr
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorCzarnecki, Piotr
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.date.accessioned2021-10-18T17:56:37Z
dc.date.available2021-10-18T17:56:37Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17426
dc.source.beginpage1249-F08-14
dc.source.conferenceAdvanced Interconnects and Chemical Mechanical Planarization for Micro- and Nanoelectronics
dc.source.conferencedate5/04/2010
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Towards the understanding of resistive contrast imaging in in situ dielectric breakdown studies using a nanoprober setup

dc.typeProceedings paper
dspace.entity.typePublication
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