Publication:

Further study on the verification of CD-SEM based monitoring for hyper NA lithography

Date

2008
Proceedings Paper
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dc.contributor.authorIshimoto, Toru
dc.contributor.authorOsaki, M.
dc.contributor.authorSekiguchi, Kohei
dc.contributor.authorHasegawa, N.
dc.contributor.authorWatanabe, K.
dc.contributor.authorLaidler, David
dc.contributor.authorCheng, Shaunee
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.accessioned2021-10-17T07:51:03Z
dc.date.available2021-10-17T07:51:03Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13917
dc.source.beginpage69222O
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXII
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.title

Further study on the verification of CD-SEM based monitoring for hyper NA lithography

dc.typeProceedings paper
dspace.entity.typePublication
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