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Epitaxial GeSn: Impact of process conditions on material quality

Date

2018
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dc.contributor.authorLoo, Roger
dc.contributor.authorShimura, Yosuke
dc.contributor.authorIke, Shinichi
dc.contributor.authorVohra, Anurag
dc.contributor.authorStoica, Toma
dc.contributor.authorStange, Daniela
dc.contributor.authorBuca, Dan
dc.contributor.authorKohen, David
dc.contributor.authorMargetis, Joe
dc.contributor.authorTolle, John
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVohra, Anurag
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecVohra, Anurag::0000-0002-2831-0719
dc.date.accessioned2021-10-25T22:30:54Z
dc.date.available2021-10-25T22:30:54Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31235
dc.identifier.urlhttps://www.european-mrs.com/monolithic-and-heterogeneous-integration-advanced-materials-devices-silicon-emrs
dc.source.conferenceeMRS 2018 Fall Meeting, Symposium U: Monolithic and Heterogeneous Integration of Advanced Materials & Devices on Silicon
dc.source.conferencedate17/09/2018
dc.source.conferencelocationWarsaw Poland
dc.title

Epitaxial GeSn: Impact of process conditions on material quality

dc.typeOral presentation
dspace.entity.typePublication
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