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Epitaxial growth schemes for Fin and Gate-All-Around devices

Date

2018-05
Meeting abstract
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dc.contributor.authorLoo, Roger
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorRosseel, Erik
dc.contributor.authorPorret, Clément
dc.contributor.authorVohra, Anurag
dc.contributor.authorKohen, David
dc.contributor.authorMargetis, Joe
dc.contributor.authorTolle, John
dc.contributor.authorLanger, Robert
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorVohra, Anurag
dc.contributor.imecauthorLanger, Robert
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecVohra, Anurag::0000-0002-2831-0719
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.date.accessioned2021-10-25T22:28:38Z
dc.date.available2021-10-25T22:28:38Z
dc.date.issued2018-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31231
dc.source.beginpage65
dc.source.conference1st Joint ISTDM / ICSI 2018 Conference
dc.source.conferencedate27/05/2018
dc.source.conferencelocationPotsdam Germany
dc.source.endpage66
dc.title

Epitaxial growth schemes for Fin and Gate-All-Around devices

dc.typeMeeting abstract
dspace.entity.typePublication
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