Publication:

Overlay accuracy with respect to device scaling

Date

2012
Proceedings Paper
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dc.contributor.authorLeray, Philippe
dc.contributor.authorLaidler, David
dc.contributor.authorCheng, Shaunee
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.accessioned2021-10-20T12:39:16Z
dc.date.available2021-10-20T12:39:16Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21006
dc.source.beginpage832409
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXVI
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA CA
dc.title

Overlay accuracy with respect to device scaling

dc.typeProceedings paper
dspace.entity.typePublication
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