Publication:

Experimental validation of electromigration by low frequency noise measurement for advanced interconnects application

Date

2015
Proceedings Paper
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dc.contributor.authorTang, Baojun
dc.contributor.authorCroes, Kristof
dc.contributor.authorSimoen, Eddy
dc.contributor.authorBeyne, Sofie
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorBeyne, Sofie
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.date.accessioned2021-10-22T23:27:10Z
dc.date.available2021-10-22T23:27:10Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25981
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7288613
dc.source.beginpage1
dc.source.conference23rd International Conference on Noise and 1/f Fluctuations - ICNF
dc.source.conferencedate2/06/2015
dc.source.conferencelocationXi'an China
dc.source.endpage4
dc.title

Experimental validation of electromigration by low frequency noise measurement for advanced interconnects application

dc.typeProceedings paper
dspace.entity.typePublication
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