Hafnium aluminates deposited by atomic layer deposition: Structural characterization by X-ray spectroscopy

dc.contributor.author	Huanca, D.R.
dc.contributor.author	Christiano, V.
dc.contributor.author	Adelmann, Christoph
dc.contributor.author	Kellerman, G.
dc.contributor.author	Verdonck, Patrick
dc.contributor.author	dos Santos Filho, S.
dc.contributor.imecauthor	Adelmann, Christoph
dc.contributor.imecauthor	Verdonck, Patrick
dc.contributor.orcidimec	Adelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimec	Verdonck, Patrick::0000-0003-2454-0602
dc.date.accessioned	2021-10-20T11:43:04Z
dc.date.available	2021-10-20T11:43:04Z
dc.date.issued	2012
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/20831
dc.identifier.url	http://ecst.ecsdl.org/content/49/1/383.abstract
dc.source.beginpage	383
dc.source.conference	Proceedings of the 27th Symposium on Microelectronics Technology and Devices - SBMicro
dc.source.conferencedate	30/08/2012
dc.source.conferencelocation	Brasilia Brazil
dc.source.endpage	390
dc.title	Hafnium aluminates deposited by atomic layer deposition: Structural characterization by X-ray spectroscopy
dc.type	Proceedings paper
dspace.entity.type	Publication
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