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Conference contributions
Low-frequency noise analysis of the impact of an LaO cap layer in HfSiON/Ta2C gate stack nMOSFETs
Publication:
Low-frequency noise analysis of the impact of an LaO cap layer in HfSiON/Ta2C gate stack nMOSFETs
Date
2009
Meeting abstract
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19193.pdf
182.03 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Simoen, Eddy
;
Akheyar, Amal
;
Rohr, Erika
;
Mercha, Abdelkarim
;
Claeys, Cor
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Abstract
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1922
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
1922
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations