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Analysis and optimisation of the 2D-dopant profile in a 90 nm CMOS technology using scanning spreading resistance microscopy
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1951 since deposited on 2021-10-15
1last month
Acq. date: 2026-02-27
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Statistics
Views
1951 since deposited on 2021-10-15
1last month
Acq. date: 2026-02-27
Citations