Publication:
Analysis and optimisation of the 2D-dopant profile in a 90 nm CMOS technology using scanning spreading resistance microscopy
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1950 since deposited on 2021-10-15
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Acq. date: 2026-01-09
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Views
1950 since deposited on 2021-10-15
3last month
3last week
Acq. date: 2026-01-09
Citations