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High-speed full 3D feature metrology for litho monitoring, matching and model calibration with scatterometry

Date

2012
Proceedings Paper
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dc.contributor.authorCramer, H.
dc.contributor.authorChen, An
dc.contributor.authorLi, Frank
dc.contributor.authorLeray, Philippe
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorCheng, Shaunee
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-20T10:24:38Z
dc.date.available2021-10-20T10:24:38Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20505
dc.source.beginpage83240R
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXVI
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
dc.title

High-speed full 3D feature metrology for litho monitoring, matching and model calibration with scatterometry

dc.typeProceedings paper
dspace.entity.typePublication
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