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Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations

Date

2005
Proceedings Paper
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dc.contributor.authorBennett, Marylyn Hoy
dc.contributor.authorGrenville, Andrew
dc.contributor.authorHector, Scott
dc.contributor.authorPalmer, Shane
dc.contributor.authorLeunissen, Peter
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorBloomstein, Theodore
dc.contributor.authorHardy, Denis E.
dc.contributor.authorRothschild, Mordechai
dc.contributor.authorHilfiker, James N.
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-16T00:45:21Z
dc.date.available2021-10-16T00:45:21Z
dc.date.embargo9999-12-31
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10083
dc.source.beginpage599
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
dc.source.endpage610
dc.title

Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations

dc.typeProceedings paper
dspace.entity.typePublication
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