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Analytical methods for SEM image enhancement: Noise and charging effect reduction for precise contour extraction.

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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-2430-7360
cris.virtual.orcid0009-0003-7321-0578
cris.virtualsource.department7a43e54d-9897-45de-884c-e7dcd19acb63
cris.virtualsource.departmentd2e86c1b-77d9-4994-ba37-32ba4a0307ab
cris.virtualsource.orcid7a43e54d-9897-45de-884c-e7dcd19acb63
cris.virtualsource.orcidd2e86c1b-77d9-4994-ba37-32ba4a0307ab
dc.contributor.authorAbaidi, Mohamed
dc.contributor.authorYang, XiaoChun
dc.contributor.authorFang, Hawren
dc.contributor.authorClifford, Chris
dc.contributor.authorMeng, Renyang
dc.contributor.authorGillijns, Werner
dc.date.accessioned2026-06-01T14:34:11Z
dc.date.available2026-06-01T14:34:11Z
dc.date.createdwos2026-03-18
dc.date.issued2025
dc.description.abstractHigh-resolution images obtained via Scanning Electron Microscopy (SEM) are vital for semiconductor manufacturing and quality control. Nevertheless, SEM images often suffer from noise and charging effects, particularly when imaging non-conductive materials, leading to image distortion and measurement errors. In this study, we introduce advanced denoising techniques based on non-local and isotropic total variation minimization using the Split-Bregman algorithm to reduce noise in SEM images. Furthermore, we have used a method based on interpolation and filtering to mitigate the charging effect in SEM images. Our approach yields improved image clarity, enabling precise contour extraction and enhanced critical dimension CD matching, thereby supporting more accurate semiconductor inspection. By addressing the challenges of noise and charging effects in SEM imaging, this work contributes to the advancement of semiconductor manufacturing and quality control processes, ultimately enhancing the reliability and performance of electronic devices.
dc.description.wosFundingTextThis work is also partially founded by the European Union by 10ACE (Project: 101139972 - 10ACe - HORIZON-KDT-JU-2023-1-IA).
dc.identifier.doi10.1117/12.3063008
dc.identifier.eissn1996-756X
dc.identifier.isbn978-1-5106-9453-8
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/59507
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.relation.ispartofseriesProceedings of SPIE
dc.source.beginpage37871F
dc.source.conference40th European Mask and Lithography Conference - EMLC
dc.source.conferencedate2025-06-16
dc.source.conferencelocationDresden
dc.source.journal40TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, EMLC 2025
dc.source.numberofpages16
dc.title

Analytical methods for SEM image enhancement: Noise and charging effect reduction for precise contour extraction.

dc.typeProceedings paper
dspace.entity.typePublication
imec.internal.crawledAt2026-04-07
imec.internal.sourcecrawler
imec.internal.wosCreatedAt2026-04-07
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