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Thermal Annealing of Graphene Implanted with Mn at Ultralow Energies: From Disordered and Contaminated to Nearly Pristine Graphene

 
dc.contributor.authorLin, Pin-Cheng
dc.contributor.authorVillarreal, Renan
dc.contributor.authorBana, Harsh
dc.contributor.authorZarkua, Zviadi
dc.contributor.authorHendriks, Vince
dc.contributor.authorTsai, Hung-Chieh
dc.contributor.authorAuge, Manuel
dc.contributor.authorJunge, Felix
dc.contributor.authorHofsaess, Hans
dc.contributor.authorTosi, Ezequiel
dc.contributor.authorLacovig, Paolo
dc.contributor.authorLizzit, Silvano
dc.contributor.authorZhao, Wenjuan
dc.contributor.authorDi Santo, Giovanni
dc.contributor.authorPetaccia, Luca
dc.contributor.authorDe Feyter, Steven
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBrems, Steven
dc.contributor.authorPereira, Lino M. C.
dc.contributor.imecauthorTsai, Hung-Chieh
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorBrems, Steven
dc.contributor.orcidimecTsai, Hung-Chieh::0000-0001-6654-4885
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.date.accessioned2022-12-01T10:32:10Z
dc.date.available2022-07-14T02:30:13Z
dc.date.available2022-12-01T10:32:10Z
dc.date.issued2022
dc.description.wosFundingTextThis work was funded by KU Leuven and FWO Vlaanderen. The authors acknowledge Elettra Sincrotrone Trieste for providing access to its synchrotron radiation facilities and, in particular, to the BaDElPh and SuperESCA beamlines. The access to the Elettra Sincrotrone Trieste has been supported by the project CALIPSOplus under Grant Agreement 730872 from the EU Framework Programme for Research and Innovation HORIZON 2020. The authors also thank Peter Walke for the support with the Raman spectroscopy measurements.
dc.identifier.doi10.1021/acs.jpcc.2c00855
dc.identifier.issn1932-7447
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40114
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage10494
dc.source.endpage10505
dc.source.issue25
dc.source.journalJOURNAL OF PHYSICAL CHEMISTRY C
dc.source.numberofpages12
dc.source.volume126
dc.subject.keywordsSINGLE-LAYER GRAPHENE
dc.subject.keywordsION-IMPLANTATION
dc.subject.keywordsELECTRONIC-STRUCTURE
dc.subject.keywordsCU(111)
dc.subject.keywordsGROWTH
dc.subject.keywordsOXIDATION
dc.subject.keywordsFILMS
dc.subject.keywordsXPS
dc.subject.keywordsCU
dc.title

Thermal Annealing of Graphene Implanted with Mn at Ultralow Energies: From Disordered and Contaminated to Nearly Pristine Graphene

dc.typeJournal article
dspace.entity.typePublication
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