Publication:

Top pinned magnetic tunnel junction stacks with high annealing tolerance for high density STT-MRAM applications

Date

2017
Meeting abstract
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dc.contributor.authorSwerts, Johan
dc.contributor.authorCouet, Sebastien
dc.contributor.authorLiu, Enlong
dc.contributor.authorMertens, Sofie
dc.contributor.authorLin, Tsann
dc.contributor.authorRao, Siddharth
dc.contributor.authorKim, Woojin
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorFurnemont, Arnaud
dc.contributor.authorKar, Gouri Sankar
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorCouet, Sebastien
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorRao, Siddharth
dc.contributor.imecauthorKim, Woojin
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorFurnemont, Arnaud
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecCouet, Sebastien::0000-0001-6436-9593
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecRao, Siddharth::0000-0001-6161-3052
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecFurnemont, Arnaud::0000-0002-6378-1030
dc.date.accessioned2021-10-24T14:31:52Z
dc.date.available2021-10-24T14:31:52Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29531
dc.identifier.urlhttp://ieeexplore.ieee.org/document/8007702/
dc.source.beginpageCF-04
dc.source.conferenceIEEE International Magnetics Conference - INTERMAG
dc.source.conferencedate24/04/2017
dc.source.conferencelocationDublin Ireland
dc.title

Top pinned magnetic tunnel junction stacks with high annealing tolerance for high density STT-MRAM applications

dc.typeMeeting abstract
dspace.entity.typePublication
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