Publication:
Profile changes and self-sputtering during low energy ion implantation
Date
| dc.contributor.author | Vandervorst, Wilfried | |
| dc.contributor.author | Janssens, Tom | |
| dc.contributor.author | Brijs, Bert | |
| dc.contributor.author | Lindsay, Richard | |
| dc.contributor.author | Collart, E.J.H. | |
| dc.contributor.author | Kirkwood, D.A. | |
| dc.contributor.author | Mathot, G. | |
| dc.contributor.author | Terwagne, G. | |
| dc.contributor.imecauthor | Vandervorst, Wilfried | |
| dc.date.accessioned | 2021-10-14T23:45:46Z | |
| dc.date.available | 2021-10-14T23:45:46Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6987 | |
| dc.source.beginpage | C7.2 | |
| dc.source.conference | Silicon Front-End Junction Formation Technologies | |
| dc.source.conferencedate | 1/04/2002 | |
| dc.source.conferencelocation | San Francisco, CA USA | |
| dc.title | Profile changes and self-sputtering during low energy ion implantation | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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