Publication:

Self-affine surface roughness of chemically and thermally cleaned Ge surfaces

Date

2011
Journal article
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dc.contributor.authorFleischmann, Claudia
dc.contributor.authorHoussa, Michel
dc.contributor.authorSioncke, Sonja
dc.contributor.authorBeckhoff, Burkhard
dc.contributor.authorMuller, Matthias
dc.contributor.authorHonicke, Phillip
dc.contributor.authorMeuris, Marc
dc.contributor.authorTemst, Kristiaan
dc.contributor.authorVantomme, Andre
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorTemst, Kristiaan
dc.contributor.imecauthorVantomme, Andre
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-19T13:33:27Z
dc.date.available2021-10-19T13:33:27Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18915
dc.source.beginpageH1090
dc.source.endpageH1096
dc.source.issue10
dc.source.journalJournal of the Electrochemical Society
dc.source.volume158
dc.title

Self-affine surface roughness of chemically and thermally cleaned Ge surfaces

dc.typeJournal article
dspace.entity.typePublication
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