Effect of chemical solutions and surface wettability on the stability of advanced porous low-k materials

dc.contributor.author	Le, Quoc Toan
dc.contributor.author	Vereecke, Guy
dc.contributor.author	Bertha, Anne
dc.contributor.author	Kesters, Els
dc.contributor.author	Lux, Marcel
dc.contributor.author	Struyf, Herbert
dc.contributor.imecauthor	Le, Quoc Toan
dc.contributor.imecauthor	Vereecke, Guy
dc.contributor.imecauthor	Kesters, Els
dc.contributor.imecauthor	Lux, Marcel
dc.contributor.imecauthor	Struyf, Herbert
dc.contributor.orcidimec	Le, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimec	Vereecke, Guy::0000-0001-9058-9338
dc.date.accessioned	2021-10-19T15:18:45Z
dc.date.available	2021-10-19T15:18:45Z
dc.date.issued	2011
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/19262
dc.source.beginpage	1335-o03-02
dc.source.conference	Materials, Processes, and Reliability for Advanced Interconnects for Micro- and Nanoelectronics
dc.source.conferencedate	26/04/2011
dc.source.conferencelocation	San Francisco, CA USA
dc.title	Effect of chemical solutions and surface wettability on the stability of advanced porous low-k materials
dc.type	Proceedings paper
dspace.entity.type	Publication
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