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Electromigration-induced drift in damascene and plasma-etched Al(Cu). I: Kinetics of Cu depletion in polycrystalline interconnects
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Electromigration-induced drift in damascene and plasma-etched Al(Cu). I: Kinetics of Cu depletion in polycrystalline interconnects
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Date
2000
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Proost, Joris
;
Witvrouw, Ann
;
Maex, Karen
;
D'Haen, Jan
;
Cosemans, P.
Journal
Journal of Applied Physics
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1871
since deposited on 2021-10-14
Acq. date: 2025-12-10
Citations
Metrics
Views
1871
since deposited on 2021-10-14
Acq. date: 2025-12-10
Citations