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Articles
Self-annealing characterization of electroplated copper films
Publication:
Self-annealing characterization of electroplated copper films
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Date
2000
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lagrange, Sébastien
;
Brongersma, Sywert
;
Judelewicz, Moshe
;
Saerens, Annelies
;
Vervoort, Iwan
;
Richard, Emmanuel
;
Palmans, Roger
;
Maex, Karen
Journal
Microelectronic Engineering
Abstract
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1978
since deposited on 2021-10-14
2
last month
Acq. date: 2026-01-08
Citations
Metrics
Views
1978
since deposited on 2021-10-14
2
last month
Acq. date: 2026-01-08
Citations