Publication:

Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques

Date

2007
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorVleeming, Bert
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorQuaedackers, John
dc.contributor.authorvan der Heijden, Eddy
dc.contributor.authorde Haas, Paul
dc.contributor.authorUzunbajakau, Siarhei
dc.contributor.authorMeessen, Jeroen
dc.contributor.authorDicker, Gerald
dc.contributor.authorFinders, Jo
dc.contributor.authorDusa, Mircea
dc.contributor.authorJaenen, Patrick
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorLocorotondo, Sabrina
dc.date.accessioned2021-10-16T21:30:46Z
dc.date.available2021-10-16T21:30:46Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13193
dc.source.conference4th International Symposium on Immersion Lithography
dc.source.conferencedate9/10/2007
dc.source.conferencelocationKeystone, CO USA
dc.title

Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections:
Presentations