Publication:

Statistical simulation of resist at EUV and ArF

Date

2009
Proceedings Paper
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dc.contributor.authorBiafore, John
dc.contributor.authorSmith, Mark
dc.contributor.authorMack, Chris A.
dc.contributor.authorThackeray, James
dc.contributor.authorGronheid, Roel
dc.contributor.authorRobertson, Stewart
dc.contributor.authorGraves, Trey
dc.contributor.authorBlankenship, David
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-17T21:23:55Z
dc.date.available2021-10-17T21:23:55Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14999
dc.source.beginpage727319
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXVI
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
dc.title

Statistical simulation of resist at EUV and ArF

dc.typeProceedings paper
dspace.entity.typePublication
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