Extrinsic interface formation of HfO2 and Al2O3 /GeOx gate stacks on Ge (100) substrates

Publication:

2009

Journal article

Author(s)

;

;

;

;

;

;

Journal of Applied Physics

1992 since deposited on 2021-10-18

1last month

1last week

Acq. date: 2026-03-17