Publication:
DI water purity concerns for post-clean rinsing
Date
| dc.contributor.author | Loewenstein, Lee | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.date.accessioned | 2021-10-01T08:29:12Z | |
| dc.date.available | 2021-10-01T08:29:12Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2739 | |
| dc.source.beginpage | 432 | |
| dc.source.conference | 7th International Symposium on Semiconductor Manufacturing | |
| dc.source.conferencedate | 7/10/1998 | |
| dc.source.conferencelocation | Tokyo Japan | |
| dc.source.endpage | 435 | |
| dc.title | DI water purity concerns for post-clean rinsing | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |