Characterization of EUV optics contamination due to photoresist related outgassing

dc.contributor.author	Pollentier, Ivan
dc.contributor.author	Goethals, Mieke
dc.contributor.author	Gronheid, Roel
dc.contributor.author	Steinhoff, J.
dc.contributor.author	Van Dijk, J.
dc.contributor.imecauthor	Pollentier, Ivan
dc.contributor.imecauthor	Gronheid, Roel
dc.contributor.orcidimec	Pollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned	2021-10-18T20:23:41Z
dc.date.available	2021-10-18T20:23:41Z
dc.date.embargo	9999-12-31
dc.date.issued	2010
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/17818
dc.source.beginpage	76361W
dc.source.conference	Extreme Ultraviolet (EUV) Lithography
dc.source.conferencedate	21/02/2010
dc.source.conferencelocation	San Jose, CA USA
dc.title	Characterization of EUV optics contamination due to photoresist related outgassing
dc.type	Proceedings paper
dspace.entity.type	Publication
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