Publication:

Aequeous chemical solution deposition for ferroelectric thin films

Date

2002
Journal article
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dc.contributor.authorVan Bael, M.K.
dc.contributor.authorNelis, Daniël
dc.contributor.authorHardy, A.
dc.contributor.authorMondelaers, D.
dc.contributor.authorVan Werde, K.
dc.contributor.authorD'Haen, Jan
dc.contributor.authorVanhoyland, G.
dc.contributor.authorVan den Rul, H.
dc.contributor.authorMullens, J.
dc.contributor.authorVan Poucke, L.C.
dc.contributor.authorFrederix, Filip
dc.contributor.authorWouters, Dirk
dc.contributor.imecauthorD'Haen, Jan
dc.date.accessioned2021-10-14T23:26:51Z
dc.date.available2021-10-14T23:26:51Z
dc.date.embargo9999-12-31
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6902
dc.source.beginpage113
dc.source.endpage122
dc.source.journalIntegrated Ferroelectrics
dc.source.volume45
dc.title

Aequeous chemical solution deposition for ferroelectric thin films

dc.typeJournal article
dspace.entity.typePublication
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