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Removal of photoresist and BARC in Cu BEOL using an all-wet process
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Removal of photoresist and BARC in Cu BEOL using an all-wet process
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Date
2009
Proceedings Paper
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18424.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Le, Quoc Toan
;
Klipp, Andreas
;
Lux, Marcel
;
Li, Yunlong
;
Zhao, Larry
;
Vereecke, Guy
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1943
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-10
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Metrics
Views
1943
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-10
Citations