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Novel aberration monitor for optical lithography
Publication:
Novel aberration monitor for optical lithography
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Date
1999
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Dirksen, Peter
;
Juffermans, Casper
;
Pellens, R. J.
;
Maenhoudt, Mireille
;
De Bisschop, Peter
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1965
since deposited on 2021-10-06
Acq. date: 2025-12-10
Citations
Metrics
Views
1965
since deposited on 2021-10-06
Acq. date: 2025-12-10
Citations