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Conference contributions
In-situ spatial analysis of RF voltage during plasma etching
Publication:
In-situ spatial analysis of RF voltage during plasma etching
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Date
2008
Meeting abstract
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16563.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Milenin, Alexey
;
de Marneffe, Jean-Francois
;
Struyf, Herbert
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Abstract
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1821
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Acq. date: 2025-12-16
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Views
1821
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-16
Citations